Inductively coupled high-density plasma reactor for plasma accelerating material treatment

PURPOSE: To inhibit a capacity which couples between a coil-shaped high-density antenna and a plasma. CONSTITUTION: An inductively coupled plasma reactor has a high-frequency antenna 45, a high-frequency power supply for feeding high-frequency power to the antenna 45, and a unit for electrically insulating the antenna from the power supply so as to reduce a capacity coupling between those of the antenna 45 and the power supply. Preferably, as the unit for insulating the antenna from the power supply, a transformer 55, which has a primary winding 60 connected with the power supply and a secondary winding 65 connected with the antenna, is suitable. Moreover, preferably, it is better that a conductive Farady shield, which has a plurality of layers, is arranged between the antenna and the ceiling of a vacuum chamber and has an eddy current inhibiting aperture facing the conductive parts of the adjacent layers in each layer, is provided in the reactor. The ceiling of the vacuum chamber acts as a gas-distributing manifold, and the layer on the inside of the ceiling is used as a shower head for the gas-distributing manifold.