Implementation of Robust Nickel Alloy Salicide Process for High-Performance 65nm SOI CMOS Manufacturing
2007
Addition of Pt to Ni silicide produces a robust [Ni x Pt (1-x) ]Si, which shows an improved morphological stability, an important reduction in encroachment defect density, a reduced tendency to form NiSi 2 and significant variations in monosilicide texture without degrading the device performance or the yield of high-performance 65 nm SOI technologies.
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