Development of a high-energy Kirkpatrick Baez microscope

X-ray imaging of the laser produced plasma plays an important role in plasma diagnostics. Based on the urgent needs of conducting deeper and finer physical experiments, we developed a high-energy Kirkpatrick Baez microscope working at 17.48keV with a spectral resolution (E/uE) of ~30. The concave spherical substrates was polished, ultrasonically cleaned and coated. The substrates have a radius of curvature of 20m with a roughness better than 0.3nm. The grazing incidence angles are designed at 0.7° and 0.73° for separate reflecting mirrors. The x-ray backlit imaging experiments show its spatial resolution is ~5.5μm at best focus. The effective field of view is measured to be ~90μm, which is consistent with the multilayer design. This article provides detailed informations for the optical design, multilayers coating and characterization of the microscope. The microscope promises to be a high-energy, high-resolution, and energy resolved X-ray diagnostics instrument for SG series laser facility.