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Si Quantum-Dot Formation in Oxide Film using Hot Si+ Ion Implantation
Si Quantum-Dot Formation in Oxide Film using Hot Si+ Ion Implantation
2021
Kazuma Yoshimizu
Koki Murakawa
Takashi Aoki
Toshiyuki Sameshima
Tomohisa Mizuno
Keywords:
Oxide
Ion implantation
Materials science
Quantum dot
Optoelectronics
Correction
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