(Ge,Mn): A ferromagnetic semiconductor for spin injection in silicon

Spin injection in semiconductors has been a long-standing issue in the field of spintronics for nearly 10 years. Only at the end of the 1990s, electrical spin injection in III-V semiconductors could be demonstrated using spin-light emitting diodes as spin detectors. Although silicon is the key material of microelectronics, spin injection in silicon could be achieved only recently in 2007. For this purpose, we have developed a new ferromagnetic semiconductor (Ge,Mn) that may be suitable for spin injection in silicon. Indeed this material is compatible with mainstream silicon technology and is predicted as a half-metallic ferromagnet. We have used low temperature molecular beam epitaxy to grow germanium films doped with manganese. Growth temperatures as well as Mn concentrations were kept low in order to avoid phase separation due to the low solubility of Mn in Ge. Careful structural and chemical analyses showed that (Ge,Mn) films are not diluted magnetic semiconductors. We rather observe high-TC ferromagne...