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STUDY ON OVER-TOP COATING OF POSITIVE CHEMICAL AMPLIFICATION RESISTS FOR KrF EXCIMER LASER LITHOGRAPHY
STUDY ON OVER-TOP COATING OF POSITIVE CHEMICAL AMPLIFICATION RESISTS FOR KrF EXCIMER LASER LITHOGRAPHY
1993
Teruhiko Kumada
Shigeru Kubota
Hiroshi Koezuka
Tetsuro Hanawa
Hiroaki Morimoto
Keywords:
Photochemistry
Excimer laser
Coating
Lithography
Resist
Materials science
Optoelectronics
chemical amplification
Correction
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