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Characterization of pn-Diode Fabricated from Surface Damage-Free 4H-SiC Wafer Using Si-Vapor Etching Process
Characterization of pn-Diode Fabricated from Surface Damage-Free 4H-SiC Wafer Using Si-Vapor Etching Process
2018
Satoshi Torimi
Norihito Yabuki
Takuya Sakaguchi
Masato Shinohara
Yoji Teramoto
Satoru Nogami
Makoto Kitabatake
Junji Senzaki
Keywords:
Composite material
Etching
Materials science
Wafer
Diode
pn diode
Correction
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