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Improvement in ferroelectricity of HfxZr1−xO2 thin films using ZrO2 seed layer
Improvement in ferroelectricity of HfxZr1−xO2 thin films using ZrO2 seed layer
2017
Takashi Onaya
Toshihide Nabatame
Naomi Sawamoto
Akihiko Ohi
Naoki Ikeda
Toyohiro Chikyow
Atsushi Ogura
Keywords:
Thin film
Analytical chemistry
Ferroelectricity
Optoelectronics
Chemistry
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