Present status of laser-produced plasma EUV light source
2010
The development status of key technologies for a HVM laser-produced plasma EUV light source is presented. This
includes the high-power RF-excited CO 2 laser, the Sn droplet target and the collector mirror lifetime enhancement
technology. In this paper, we mainly discuss countermeasures for Sn ions and neutrals which cause mirror reflectivity
degradation. The effectiveness of ion mitigation by a strong magnetic field was measured. We also observed that Sn
neutrals were removed by etching gases and that the etching process did not degrade the effectiveness of the ion
mitigation by the magnetic field. A part of this work was supported by the New Energy and Industrial Technology
Development Organization (NEDO), Japan.
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