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Physical property of silicon oxide film by atomic layer deposition method
Physical property of silicon oxide film by atomic layer deposition method
2020
Kenshiro Usuki
Mochizuki Toshimitsu
Tanahashi Katsuto
Takato Hidetaka
Yamaguchi Katsuhiko
Keywords:
Optoelectronics
Atomic layer deposition
Physical property
Silicon oxide
Materials science
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