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Matthew VanHanehem
Matthew VanHanehem
Dow Chemical Company
Cobalt
Polishing
Slurry
Materials science
Metallurgy
3
Papers
2
Citations
0
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Key Enabling Materials for 3DIC Fabrication and Device Performance
2019
Michael Gallagher
Ed Anzures
Robert Auger
Rosemary Bell
Berry Paul
Hua Dong
Michelle Ho
Joe Lachowski
Yil-Hak Lee
Masaki Kondo
Julia Kozhukh
Paul Morganelli
Janet Okada
Ravi Pokhrel
Jonathan Prange
Matthew VanHanehem
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Development of Advanced Cobalt CMP Slurry Platform By Electrochemical Screening and Polishing Studies
2017
Murali G. Theivanayagam
Hongyu Wang
Matthew VanHanehem
Robert Auger
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Development of Cobalt Chemical Mechanical Planarization Slurries By Electrochemical/Surface Analytical Screening and Polishing Studies
2016
Murali G. Theivanayagam
Hongyu Wang
Jamie Cohen
Matthew VanHanehem
Tim Sabo
Stephan DeNardi
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