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Shiqun Gu
Shiqun Gu
LSI Corporation
Analytical chemistry
Plasma
Chemistry
Gate oxide
Resist
4
Papers
49
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Process Characterization and Control of Polycrystalline SiGe as the Gate Electrode in CMOS Fabrication
2005
Journal of The Electrochemical Society
Hong Lin
Wai Lo
Shiqun Gu
Verne Hornback
Jim Elmer
Wilbur G. Catabay
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Citations (4)
Damage of Low-k and Ultralow-k Dielectrics from Reductive Plasma Discharges Used for Photoresist Removal
2005
Journal of The Electrochemical Society
Darren Moore
Richard Carter
Hao Cui
Peter A. Burke
Shiqun Gu
Huagen Peng
Richard S. Valley
David W. Gidley
Carlo Waldfried
Orlando Escorcia
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Citations (21)
Process integration compatibility of low-k and ultra-low-k dielectrics
2005
Journal of Vacuum Science & Technology B
Darren Moore
Richard Carter
Hao Cui
Peter J. Burke
Peter McGrath
Shiqun Gu
David W. Gidley
Huagen Peng
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Citations (21)
Impact of F species on plasma charge damage in a RF asher
2002
PPID | International Symposium on Plasma Process-Induced Damage
Shiqun Gu
R. Fujimoto
Peter McGrath
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Citations (3)
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