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S. Aravamudhan
S. Aravamudhan
Alcatel-Lucent
Analytical chemistry
High-κ dielectric
Gate dielectric
Amorphous solid
Optoelectronics
3
Papers
225
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Chemical vapor deposition of HfO2 films on Si(100)
2002
Journal of Vacuum Science and Technology
S. Sayan
S. Aravamudhan
B. W. Busch
W. H. Schulte
F. Cosandey
G. D. Wilk
T. Gustafsson
Eric Garfunkel
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Citations (91)
Multi-component high-K gate dielectrics for the silicon industry
2001
Microelectronic Engineering
L Manchanda
M.D. Morris
Martin L. Green
R. B. van Dover
F. Klemens
T. Sorsch
P.J. Silverman
G. D. Wilk
B Busch
S. Aravamudhan
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Citations (118)
High K gate dielectrics for the silicon industry
2001
L. Manchanda
B. Busch
Martin L. Green
M.D. Morris
R. B. van Dover
R. Kwo
S. Aravamudhan
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Citations (16)
1