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E. te Sligte
E. te Sligte
Netherlands Organisation for Applied Scientific Research
Extreme ultraviolet lithography
Beamline
Optics
Contamination control
Manufacturing engineering
4
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1
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Latest developments on EUV reticle and pellicle research and technology at TNO
2017
R. Verberk
N.B. Koster
E. te Sligte
W.P.M. Staring
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Characterization of EBL2 EUV exposure facility
2017
E. te Sligte
M. van Putten
Freek Molkenboer
P. van der Walle
Pim Muilwijk
N.B. Koster
J. Westerhout
Peter Kerkhof
Bastiaan Oostdijck
Wouter Mulckhuyse
Alex Deutz
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First light on EBL2
2017
N.B. Koster
E. te Sligte
Freek Molkenboer
Alex Deutz
P. van der Walle
Pim Muilwijk
Wouter Mulckhuyse
Bastiaan Oostdijck
Christiaan Hollemans
Björn Nijland
Peter Kerkhof
M. van Putten
J. Westerhout
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EBL2: a flexible and controlled EUV exposure and surface analysis system
2015
E. te Sligte
N.B. Koster
P. van der Walle
Alex Deutz
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