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Olivier Pollet
Olivier Pollet
Analytical chemistry
Etching (microfabrication)
Dry etching
Silicon nitride
Reactive-ion etching
5
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56
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Thin layer etching of low-k SiCO spacer using hydrogen ion implantation followed by hydrofluoric acid
2018
Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
Nicolas Posseme
Maxime Garcia Barros
F. Leverd
D. Benoit
Olivier Pollet
G. Audoit
Cyril Guedj
Audrey Jannaud
S. Barnola
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Citations (1)
Understanding of a new approach for silicon nitride spacer etching using gaseous hydrofluoric acid after hydrogen ion implantation
2017
Journal of Vacuum Science and Technology
Vincent Ah-Leung
Olivier Pollet
Nicolas Posseme
Maxime Garcia Barros
N. Rochat
Cyril Guedj
Guillaume Audoit
Sebastien Barnola
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Citations (6)
Thin Layer Etching of Silicon Nitride: Comparison of Downstream Plasma, Liquid HF and Gaseous HF Processes for Selective Removal after Light Ion Implantation
2016
Solid State Phenomena
Olivier Pollet
Nicolas Posseme
Vincent Ah-Leung
Maxime Garcia Barros
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Thin layer etching of silicon nitride: A comprehensive study of selective removal using NH3/NF3 remote plasma
2016
Journal of Vacuum Science and Technology
Nicolas Posseme
Vincent Ah-Leung
Olivier Pollet
C. Arvet
Maxime Garcia Barros
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Citations (17)
Alternative process for thin layer etching: Application to nitride spacer etching stopping on silicon germanium
2014
Applied Physics Letters
Nicolas Posseme
Olivier Pollet
S. Barnola
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Citations (30)
1