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S. Belahcen
S. Belahcen
Centre national de la recherche scientifique
Optoelectronics
Optics
Sputter deposition
Deposition (law)
Nanolithography
2
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10
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0
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Topographically selective deposition
2019
Applied Physics Letters
Ahmad Chaker
C. Vallée
V. Pesce
S. Belahcen
R. Vallat
Remy Gassilloud
N. Posseme
M. Bonvalot
Ahmad Bsiesy
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Citations (5)
Impact of roughness of TiN bottom electrode on the forming voltage of HfO2 based resistive memories
2019
Microelectronic Engineering
Christelle Charpin Nicolle
M. Bonvalot
R. Sommer
A. Persico
M.L. Cordeau
S. Belahcen
B. Eychenne
Ph. Blaise
S. Martinie
S. Bernasconi
E. Jalaguier
E. Nowak
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Citations (5)
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