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R. Bowley
R. Bowley
IBM
Optics
Materials science
Critical dimension
Resist
Scanning electron microscope
2
Papers
1
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0
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Characterization of a new polarity switching negative tone e-beam resist for 14nm and 10nm logic node mask fabrication and beyond
2014
Tom Faure
Amy E. Zweber
Luisa D. Bozano
Martha I. Sanchez
R. Sooriyakumaran
Linda K. Sundberg
Yoshifumi Sakamoto
Steven C. Nash
Masayuki Kagawa
Takeshi Isogawa
Tasuku Senna
Masahito Tanabe
Toru Komizo
I Yoshida
Keiichi Masunaga
Satoshi Watanabe
Yoshio Kawai
Joseph L. Malenfant
R. Bowley
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Accuracy and precision of scatterometer measurements relative to conventional CD metrology
2000
LEOS | Lasers and Electro-Optics Society Meeting
T. Hayes
R. Bowley
M. Littau
C. Raymond
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