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S. Barai
S. Barai
IBM
Integrated circuit layout
Immersion lithography
Lithography
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Two-dimensional mask effects at the 14 nm logic node
2013
Amy E. Zweber
Anne McGuire
Michael S. Hibbs
Steven C. Nash
K. Ballman
Tom Faure
Jed H. Rankin
Takeshi Isogawa
Tasuku Senna
Yoshiyuki Negishi
M. Miller
S. Barai
Dan J. Dechene
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