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G. Reichl
G. Reichl
Infineon Technologies
Spectral purity
Ion beam
Ion implantation
Wafer
Sheet resistance
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Evaluation of ION-X ® Hydride Dopant Gas Sources on a Varian VIISion High Current Implanter
2018
K. Kerkel
J. Arnó
G. Reichl
J. Feicht
H. Winzig
Omar K. Farha
William Morris
Paul W. Siu
G. M. Tom
Mitchell H. Weston
Patrick E. Fuller
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