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Tan Tianya
Tan Tianya
Chinese Academy of Sciences
Optics
Physics
Thin film
Electron beam physical vapor deposition
Optoelectronics
5
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11
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BiCl 3 をドープしたn型SnSeの熱電気的性質の最適化
2016
Applied Physics Letters
Wang Xue
Xu Jingtao
Liu Guoqiang
Fu Yajie
Liu Zhu
Tan Xiaojian
Shao Hezhu
Jiang Haochuan
Tan Tianya
Jiang Jun
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Citations (3)
Influence of Buffer Layer on Performances of 1064 nm, 532 nm Frequency-Doubled Antireflection Coating for LiB3O5
2010
Acta Optica Sinica
Tan Tianya
Yu Hanjiang
Wu Wei
Guo Yongxin
Shao Jianda
Fan Zheng-Xiu
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バッファ層の厚さが1064NM,532NMの膜の付着力に及ぼす影響を研究した。【JST・京大機械翻訳】
2009
Tan Tianya
Wu Wei
Guo Yongxin
Shao Jianda
Fan Zheng-Xiu
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Influence of LiB3O5 structure on microstructure and optical properties of ZrO2, thin films prepared by electron beam evaporation
2005
Chinese Physics Letters
Tan Tianya
Zhang Dawei
Zhan Mei-Qiong
Shao Jianda
Fan Zheng-Xiu
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Citations (1)
Optical, Structural and Laser-Induced Damage Threshold Properties of HfO2 Thin Films Prepared by Electron Beam Evaporation
2005
Chinese Physics Letters
Zhan Mei-Qiong
Zhang Dongping
Tan Tianya
He Hong-Bo
Shao Jianda
Fan Zheng-Xiu
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Citations (7)
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