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Ghewa Akiki
Ghewa Akiki
École Polytechnique
Plasma-enhanced chemical vapor deposition
Materials science
Silicon
Silicon nitride
Deposition (law)
3
Papers
1
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0
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Origin of area selective plasma enhanced chemical vapor deposition of microcrystalline silicon
2021
Journal of Vacuum Science and Technology
Ghewa Akiki
Mathieu Fregnaux
Ileana Florea
Pavel Bulkin
D. Daineka
Sergej Filonovich
Muriel Bouttemy
Erik V. Johnson
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Area Selective Deposition of Silicon by Plasma Enhanced Chemical Vapor Deposition using a Fluorinated Precursor
2020
Applied Surface Science
Ghewa Akiki
Daniel Suchet
D. Daineka
Sergej Filonovich
Pavel Bulkin
Erik V. Johnson
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Area Selective Plasma Enhanced Chemical Vapor Deposition of Silicon on Silicon Nitride and Aluminum Oxide.
2020
Bulletin of the American Physical Society
Ghewa Akiki
Daniel Suchet
D. Daineka
Sergej Filonovich
Pavel Bulkin
Erik V. Johnson
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