Old Web
English
Sign In
Acemap
>
authorDetail
>
Dominic Yang
Dominic Yang
IBM
Resist
Laser linewidth
Materials science
Photochemistry
Lithography
4
Papers
7
Citations
0.00
KQI
Citation Trend
Filter By
Interval:
1900~2024
1900
2024
Author
Papers (4)
Sort By
Default
Most Recent
Most Early
Most Citation
No data
Journal
Conference
Others
jdmoorman/uclasm: v0.2.0
2020
Jacob D. Moorman
Thomas K. Tu
Qinyi Chen
Dominic Yang
Xie He
Show All
Source
Cite
Save
Citations (0)
Chemistry of Ketal Resist System and Its Lithographic Performance
1998
Wu-Song Huang
Kim Y. Lee
Rao Bantu
Ranee Kwong
Ahmad D. Katnani
Mahmoud Khojasteh
William R. Brunsvold
Steven J. Holmes
Ronald W. Nunes
Tsuyoshi Shibata
George W. Orsula
James F. Cameron
Dominic Yang
Roger F. Sinta
Show All
Source
Cite
Save
Citations (2)
New positive-tone deep-UV photoresist based on poly(4-hydroxystyrene) and an acid labile protecting group
1995
James Thomas Fahey
Will Conley
William R. Brunsvold
Dominic Yang
Wayne M. Moreau
George M. Jordhamo
Steve Pratt
Dale Murray Crockatt
George Joseph Hefferon
Robert Lavin Wood
Show All
Source
Cite
Save
Citations (1)
KRS: An Environmentally Robust Resist Based on Fast Reaction Kinetics
1995
Journal of Photopolymer Science and Technology
Wu-Song Huang
Ahmad D. Katnani
Dominic Yang
Bill Brunsvold
Rao Bantu
Mahmoud Khojasteh
R. Sooriyakumaran
Ranee Kwong
Kim Y. Lee
George Joseph Hefferon
George W. Orsula
James F. Cameron
Mark D. Denison
Roger F. Sinta
Jim Thackeray
Show All
Source
Cite
Save
Citations (4)
1