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N. Morel
N. Morel
CAMECA
Wafer
Analytical chemistry
Ion implantation
Plasma
Doping
2
Papers
3
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0
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Comparison of Different Characterization Techniques for Plasma Implanted Samples having Highly Doped and Shallow Implanted Layers: Dose Measurement, Profile, Etching or Deposition Characterizations
2011
Frank Torregrosa
Catherine Grosjean
N. Morel
M-P. Moret
M. Schuhmacher
Y. Depuydt
Yohann Spiegel
Hasnaa Etienne
S. B. Felch
Julian Duchaine
Laurent Roux
B. Bortolotti
Rachid Daineche
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Shallow As dose measurements of patterned wafers with secondary ion mass spectrometry and low energy electron induced x-ray emission spectroscopy
2010
Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
H.-U. Ehrke
Norbert Loibl
M-P. Moret
F. Horréard
J. Choi
C Hombourger
V. Paret
R Benbalagh
N. Morel
M. Schuhmacher
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Citations (2)
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