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A.K. van Langen-Suurling

Delft University of Technology

5

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47

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Deep sub-wavelength metrology for advanced defect classification

2017
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Helium ion beam lithography of thick HSQ resists

2012
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Towards 2-10nm electron-beam lithography: A quantitative approach

2008 Microelectronic Engineering
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Hydrogen SilsesQuioxane, a high-resolution negative tone e-beam resist, investigated for its applicability in photon-based lithographies

2002 Microelectronic Engineering
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Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography

2000 Microelectronic Engineering
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Citations (9)