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Kyohei Imai
Kyohei Imai
Osaka Prefecture University
Materials science
Extreme ultraviolet lithography
Optoelectronics
Pattern formation
Resist
4
Papers
1
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0
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2024
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Specific Interactions Between The Alkaline Protease of P. Aeruginosa And Its Natural Peptide Inhibitor: Ab Initio Molecular Simulations
2021
Ryosuke Saito
Kyohei Imai
Shohei Yamamoto
Takuya Ezawa
Satoshi Sugiyama
Linn Samira Mari Evenseth
Ingebrigt Sylte
Noriyuki Kurita
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Effects of acid diffusion and resist molecular size on line edge roughness for chemically amplified resists in EUV lithography: Computational study
2021
Japanese Journal of Applied Physics
Masanori Koyama
Kyohei Imai
Masamitsu Shirai
Yoshihiko Hirai
Masaaki Yasuda
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Computational study of pattern formation in extreme ultraviolet lithography
2021
The Japan Society of Applied Physics
Masanori Koyama
Kyohei Imai
Masamitsu Shirai
Yoshihiko Hirai
Masaaki Yasuda
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Stochastic Simulation of Pattern Formation for Negative-Type Chemically Amplified Resists in Extreme Ultraviolet Lithography
2020
Journal of Photopolymer Science and Technology
Masaaki Yasuda
Masanori Koyama
Kyohei Imai
Masamitsu Shirai
Hiroaki Kawata
Yoshihiko Hirai
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