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Aernout Christiaan Zonnevylle

Delft University of Technology

13

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Charge-induced pattern displacement in E-beam lithography

2019 Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
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Electron beam lithography on curved or tilted surfaces: Simulations and experiments

2019 Journal of Vacuum Science & Technology B
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Estimating Step Heights from Top-Down SEM Images

2019 Microscopy and Microanalysis
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Integrated Microscopy: Highly Accurate Light-Electron Image Correlation Anywhere on a Sample

2017 Microscopy and Microanalysis
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Multi-electron-beam deflector array

2014 Microelectronic Engineering
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Deflection properties of an electrostatic electron lens with a shifted electrode

2013 Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
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Integrated optical and charged particle inspection apparatus: Corrected version

2013
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Integration of a high-NA light microscope in a scanning electron microscope.

2013 Journal of Microscopy
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Cathodoluminescence Microscopy of nanostructures on glass substrates

2013 Optics Express
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Appareil à sous-faisceaux multiples de particules chargées

2012
- Aernout Christiaan Zonnevylle
- P. Kruit
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