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Scott Bowdoin
Scott Bowdoin
Schlumberger
Resist
Materials science
Optics
Metrology
Lithography
4
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12
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CD-SEM image acquisition effects on 193-nm resists line slimming
2003
Neal T. Sullivan
Martin E. Mastovich
Scott Bowdoin
Robert Brandom
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Citations (2)
193-nm resist: ultralow voltage CD-SEM performance for sub-130-nm contact hole process
2003
John E. Ferri
Marco Vieira
Mario Reybrouck
Martin E. Mastovich
Scott Bowdoin
Robert Brandom
Paul C. Knutrud
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Minimization of image placement errors in chromeless phase-shift mask lithography
2002
M. Fritze
Brian Tyrrell
Susan G. Cann
Chris Carney
B. A. Blachowicz
David J. Brzozowy
Thomas Kocab
Scott Bowdoin
Peter D. Rhyins
Christopher J. Progler
Patrick M. Martin
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A STUDY OF THE EFFECTIVENESS OF THE REMOVAL OF HYDROCARBON CONTAMINATION BY OXIDATIVE CLEANING INSIDE THE SEM.
2002
Microscopy and Microanalysis
Neal T. Sullivan
Tung Mai
Scott Bowdoin
Ronald Vane
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Citations (9)
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