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J. K. Yeon
J. K. Yeon
Sungkyunkwan University
Etching
Analytical chemistry
Chemistry
Ion beam
Optoelectronics
5
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24
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Removal of Anodic Aluminum Oxide Barrier Layer on Silicon Substrate by using Cl2/BCl3 Neutral Beam Etching
2011
Journal of The Electrochemical Society
J. K. Yeon
W.S. Lim
J. B. Park
Namyong Kwon
Steven Kim
K. S. Min
Ilsub Chung
Young-Ugk Kim
Geun Young Yeom
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Citations (6)
Fabrication of ordered Au nanodot arrays utilizing anodic aluminum oxide templates formed on Si substratea)
2011
Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
Namyong Kwon
Namkyu Kim
J. K. Yeon
Geun Young Yeom
Ilsub Chung
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Citations (10)
Fabrication of nano-crystalline silicon thin film at low temperature by using a neutral beam deposition method
2010
Journal of Crystal Growth
Se-Koo Kang
Min Hwan Jeon
Jong-Yoon Park
Hyoung-Cheol Lee
Byung-Jae Park
J. K. Yeon
Geun Young Yeom
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Citations (5)
Highly Selective and Low Damage Etching of GaAs/AlGaAs Heterostructure using Cl2/O2 Neutral Beam
2010
Plasma Chemistry and Plasma Processing
Byung-Jae Park
J. K. Yeon
W.S. Lim
Se-Koo Kang
J. W. Bae
Geun Young Yeom
Myung S. Jhon
S. H. Shin
K. S. Chang
J.-I. Song
Y. T. Lee
Jae-Hyung Jang
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Citations (3)
Highly Selective and Low Damage Etching of GaAs/AlGaAs Heterostructure using Cl 2 /O 2<
2010
Plasma Chemistry and Plasma Processing
Bong Jun Park
J. K. Yeon
Woongsun Lim
Sunjung Kang
Jin Woo Bae
Geun Young Yeom
Myung S. Jhon
Se H. Shin
Ki-soo Chang
Jong-Han Song
Yun Lee
Jun Ho Jang
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