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Peter Zandbergen
Peter Zandbergen
SEMATECH
Resist
Optics
Phase-shift mask
Lithography
Reticle
4
Papers
5
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Limits of optical lithography
2000
Mireille Maenhoudt
Staf Verhaegen
Kurt G. Ronse
Peter Zandbergen
Edward G. Muzio
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193-nm single-layer process for 150-nm technology generation and below
1999
Gilles R. Amblard
Peter Zandbergen
Martin McCallum
Alan Stephen
Jeff D. Byers
Kim Dean
Jeff Meute
Carla M. Nelson-Thomas
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Optical extension at the 193-nm wavelength
1999
Peter Zandbergen
Martin McCallum
Gilles R. Amblard
Wolf-Dieter Domke
Bruce W. Smith
Lena Zavyalova
John S. Petersen
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Citations (2)
193nm single layer process for 150nm technology generation and below
1999
Gilles R. Amblard
Peter Zandbergen
Martin Mccallum
Al Stephen
Jeff D. Byers
Kim Dean
Jeff Meute
Carla Nelson
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