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Fan Zhang
Fan Zhang
Chartered Semiconductor Manufacturing
Scanning electron microscope
Analytical chemistry
Electronic engineering
Engineering
Etching
3
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Effect of chemical mechanical polishing scratch on TDDB reliability and its reduction in 45nm BEOL process
2009
IRPS | International Reliability Physics Symposium
Wuping Liu
Y.K. Lim
Fan Zhang
Wenyi Zhang
C.Q. Chen
Bei Chao Zhang
J.B. Tan
Dong Kyun Sohn
Liang-Choo Hsia
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Pad etch optimization to minimize polymer
2005
Microelectronic Engineering
Xiaomei Bu
Meng Luo
ChianYuh Sin
Fan Zhang
Pradeep Ramachandramurthy Yelehanka
Tae Jong Lee
Ahila Krishnamoorthy
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Integration of a poisoning-free dual damascene CDO film stack for 90 nm & beyond low-k BEOL
2005
VLSIT | Symposium on VLSI Technology
Wu Ping Liu
J.B. Tan
Wei Lu
Shyam Pal
Yong Kong Siew
Hai Cong
Bei Chao Zhang
Xian Bin Wang
Fan Zhang
Liang-Choo Hsia
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