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De Ching Shie
De Ching Shie
National Chiao Tung University
Dielectric
Analytical chemistry
Plasma
Materials science
Optoelectronics
5
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36
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Soft breakdown of hafnium oxynitride gate dielectrics
2005
Journal of Applied Physics
Jer-Chyi Wang
De Ching Shie
Tan Fu Lei
Chung Len Lee
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Citations (5)
Characterization of Novel HfTiO Gate Dielectrics Post-treated by NH3 Plasma and Ultra-violet Rays
2005
The Japan Society of Applied Physics
Jer-Chyi Wang
Woei-Cherng Wu
Chao-Sung Lai
Jam-Wem Lee
Kuo Cheng Chiang
De Ching Shie
Tan Fu Lei
Chung Len Lee
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Turnaround of hysterisis for capacitance–voltage characteristics of hafnium oxynitride dielectrics
2004
Applied Physics Letters
Jer-Chyi Wang
De Ching Shie
Tan Fu Lei
C.L. Lee
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Characterization of temperature dependence for HfO2 gate dielectrics treated in NH3 plasma
2003
Electrochemical and Solid State Letters
Jer-Chyi Wang
De Ching Shie
Tan Fu Lei
Chung Len Lee
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Characterization of Soft Breakdown Effects for Post-deposition NH3 Plasma Treated HfO2 Gate Dielectrics
2003
The Japan Society of Applied Physics
Jer-Chyi Wang
De Ching Shie
Tan Fu Lei
Chung Len Lee
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