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Christoph Hennerkes
Christoph Hennerkes
ASML Holding
Computer science
Extreme ultraviolet lithography
Simulation
Metrology
Optical proximity correction
2
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Statistical analysis of the impact of 2D reticle variability on wafer variability in advanced EUV nodes using large-scale Monte Carlo simulations
2021
Adam Lyons
Luke Long
Wallow Thomas I
Chris Spence
Ton Kiers
Paul van Adrichem
Vidya Vaenkatesan
Christoph Hennerkes
Cyrus Tabery
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Mask contribution to OPC model accuracy
2020
Adam Lyons
Tom Wallow
Christoph Hennerkes
Chris Spence
Maxence Delorme
David Rio
Dai Tsunoda
Yohei Torigoe
Masakazu Hamaji
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