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Jason M. Benz
Jason M. Benz
IBM
Phase (waves)
Phase-shift mask
Engineering
Optics
Lithography
5
Papers
1
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0
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Evaluating films for high transmission attenuated phase shift masks
2006
Satoru Nemoto
Toru Komizo
Yasutaka Kikuchi
Emily Gallagher
Jason M. Benz
Michael S. Hibbs
Takashi Haraguchi
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Wavelength dependent spot defects on advanced embedded attenuated phase-shift masks
2004
Christopher Magg
Jason M. Benz
Louis Kindt
Adam C. Smith
Jay Burnham
Jeffrey Riendeau
Christy Johnson
Rick Kontra
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Wavelength-dependent spot defects on advanced embedded attenuated phase-shift masks
2004
Christopher Magg
Jason M. Benz
Louis Kindt
Adam C. Smith
Jay Burnham
Jeffrey Riendeau
Christy Johnson
Rick Kontra
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Evalution of 193-nm alternating-aperture phase-shift mask dry etch processes
2003
Jason Plumhoff
Chris Constantine
Jong Shin
Brad Reelfs
Emmanuel Rausa
Jason M. Benz
Michael S. Hibbs
Timothy A. Brunner
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Defect sensitivity and inspectability of the KLA SEMSpec for alternating phase-shift masks
1999
Jason M. Benz
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