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Matthias Albert
Matthias Albert
Dresden University of Technology
Optoelectronics
Graphene
Physics
Silicon
Atomic layer deposition
5
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5
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Influences on Plasmon Resonance Linewidth in Metal-Insulator-Metal Structures Obtained via Colloidal Self-Assembly.
2020
ACS Applied Materials & Interfaces
Ye Yu
Daniel Schletz
Johanna Reif
Felix Winkler
Matthias Albert
Andreas Fery
Robert Kirchner
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Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
2020
Journal of Vacuum Science and Technology
David Dustin Fischer
Martin Knaut
Johanna Reif
Frederik Nehm
Matthias Albert
Johann W. Bartha
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In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
2020
Journal of Vacuum Science and Technology
Johanna Reif
Martin Knaut
Sebastian Killge
Felix Winkler
Matthias Albert
Johann W. Bartha
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Demonstration of a graphene-base heterojunction transistor with saturated output current
2019
Journal of Applied Physics
C. Strobel
Carlos Alvarado Chavarin
B. Leszczynska
S. Leszczynski
Felix Winkler
Sebastian Killge
S. Völkel
K. Richter
André Hiess
Martin Knaut
Johanna Reif
Matthias Albert
Ch. Wenger
Johann W. Bartha
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Plasma-enhanced chemical vapor deposition of amorphous Si on graphene
2016
arXiv: Mesoscale and Nanoscale Physics
Grzegorz Lupina
C. Strobel
Jarek Dabrowski
Gunther Lippert
J. Kitzmann
H. M. Krause
Ch. Wenger
Mindaugas Lukosius
André Wolff
Matthias Albert
Johann W. Bartha
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