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Chris J. Gamsky
Chris J. Gamsky
University of Wisconsin-Madison
Analytical chemistry
Resist
Wafer
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Materials science
3
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3
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Processing control for 0.25 μm x‐ray exposures of commercially available resists: The potential for adaptive control
1995
Journal of Vacuum Science & Technology B
James W. Taylor
Chris J. Gamsky
Steve Rhyner
Glenn R. Howes
Paul M. Dentinger
Carla Nelson
Cheng Yang
Michael T. Reilly
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Quantitative analysis of chemically amplified negative photoresist using mirror-backed infrared reflection absorption spectroscopy
1995
Chris J. Gamsky
Paul M. Dentinger
Glenn R. Howes
James W. Taylor
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Correlation of Si wafer FTIR spectra with wafer temperatures and resist durability variations in plasma etching processes
1992
Gregory Luckman
Carl P. Babcock
Helen L. Maynard
Chris J. Gamsky
James W. Taylor
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