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Wyatt Thornley
Wyatt Thornley
IBM
Resist
Semiconductor
Photoresist
Materials science
Extreme ultraviolet lithography
2
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2024
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Model studies on the metal salt sensitization of chemically amplified photoresists (Conference Presentation)
2019
Gregory M. Wallraff
Hoa D. Truong
Martha I. Sanchez
Noel Arellno
Alexander Friz
Wyatt Thornley
Oleg Kostko
Daniel Slaughter
Frank Ogletree
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Model reactivity of inorganic and organometallic materials in EUV (Conference Presentation)
2019
Wyatt Thornley
Hoa D. Truong
Martha I. Sanchez
Daniel P. Sanders
Gregory M. Wallraff
Oleg Kostko
D. Frank Ogletree
Daniel Slaughter
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