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Ju-Yong Lee
Ju-Yong Lee
Samsung
Physics
Dram
Optoelectronics
Doping
Copper interconnect
5
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14
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MINIMIZING TOTAL TARDINESS ON PARALLEL MACHINES SUBJECT TO FLEXBLE MAINTENANCE
2018
International Journal of Industrial Engineering-theory Applications and Practice
Ju-Yong Lee
Yeong-Dae Kim
Tae-Eog Lee
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Citations (3)
Local-damascene-finFET DRAM integration with p/sup +/ doped poly-silicon gate technology for sub-60nm device generations
2005
IEDM | International Electron Devices Meeting
Yong-Sung Kim
Sang-Hyeon Lee
Soo-Ho Shin
Sung-hee Han
Ju-Yong Lee
Jin-woo Lee
Jun Han
Seung Chul Yang
Joon-Ho Sung
Eun-Cheol Lee
Bo-Young Song
Dong-jun Lee
Dong-il Bae
Won Suk Yang
Yang-Keun Park
Kyu-Hyun Lee
Byung-Hyuk Roh
Tae-Young Chung
Kinam Kim
Wonshik Lee
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Citations (11)
A semiconductor device having a contact pattern and manufacturing method thereof
2004
Ju-Yong Lee
Kyu Hyun. Lee
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Halbleitervorrichtung mit einem Kontaktmuster und Herstellungsverfahren dafür
2004
Ju-Yong Lee
Kyu Hyun. Lee
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Novel Cell Architecture for High Performance of 512-Mb DRAM with 0.12-µm Design Rule
2002
Jae-Goo Lee
Chang-hyun Cho
Ju-Yong Lee
Min Sang Kim
Jae-Kyu Lee
Soo-Ho Shin
Dong-Hwa Kwak
K. Koh
Gi-Tae Jeong
Hong Sik Jeong
T.Y. Chung
Kinam Kim
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