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E. Butaud
E. Butaud
Soitec
CMOS
Silicon
Planar
Silicon on insulator
Electronic engineering
3
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12
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0
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Ultra Thin Silicon Substrate for Next Generation Technology nodes IpO-P-071
2012
International Symposium on Semiconductor Manufacturing
X. Cauchy
Olivier Bonnin
F. Boedt
E. Butaud
C. Moulin
Sebastien Kerdiles
N. Daval
Cecile Aulnette
C. Girard
Christophe Maleville
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Excellent silicon thickness uniformity on Ultra-Thin SOI for controlling Vt variation of FDSOI
2011
ICICDT | International Conference on IC Design and Technology
Walter Schwarzenbach
X. Cauchy
F. Boedt
Olivier Bonnin
E. Butaud
C. Girard
B-Y. Nguyen
Carlos Mazure
Christophe Maleville
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Ultra Thin silicon substrate for next generation technology nodes
2010
ISSM | International Symposium on Semiconductor Manufacturing
Walter Schwarzenbach
X. Cauchy
Olivier Bonnin
F. Boedt
E. Butaud
C. Moulin
Sebastien Kerdiles
J.-F. Gilbert
N. Daval
Cecile Aulnette
C. Girard
Makoto Yoshimi
Christophe Maleville
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Citations (4)
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