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Alessandra Leonhardt

State University of Campinas

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A novel self-aligned double patterning integrated with Ga+ focused ion beam milling for silicon nanowire definition

2021 Microelectronic Engineering
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Ga+ focused ion beam lithography as a viable alternative for multiple fin field effect transistor prototyping

2016 Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
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FinFET prototypes fabricated by aluminium hard mask FIB milling for fin definition and SiON/TiN/Al gate stack

2016 SBMicro | Symposium on Microelectronics Technology and Devices
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Effective device electrical parameter extraction of nanoscale FinFETs: Challenges and results

2015 ICM | International Conference on Microelectronics
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