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Max Christian Schuermann
Max Christian Schuermann
Extreme ultraviolet
Radiation
Extreme ultraviolet lithography
Metrology
Optics
5
Papers
23
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Status of EUV-lamp development and demonstration of applications
2004
Rainer Lebert
Christian Wies
Bernhard Jaegle
Larissa Juschkin
Ulrich Bieberle
Manfred Meisen
Willi Neff
Klaus Bergmann
Konstantin Walter
Oliver Rosier
Max Christian Schuermann
Thomas Missalla
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Citations (7)
Extreme ultraviolet sources and measurement tools for EUV-lithography and system development
2003
Kai Gaebel
Juergen Kleinschmidt
Guido Schriever
Uwe Stamm
Rainer Lebert
Max Christian Schuermann
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Compact electron-based extreme-ultraviolet source at 13.5 nm
2003
A. Egbert
Bjoern Mader
Boris Tkachenko
Andreas Ostendorf
Boris N. Chichkov
Thomas Missalla
Max Christian Schuermann
Kai Gaebel
Guido Schriever
Uwe Stamm
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Dispositif permettant de determiner la reflectivite spectrale d'un appareil de mesure
2003
Max Christian Schuermann
Thomas Missalla
Bernd Seher
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Metrology tools for EUVL-source characterization and optimization
2003
Thomas Missalla
Max Christian Schuermann
Rainer Lebert
Christian Wies
Larissa Juschkin
Roman Klein
Frank Scholze
G. Ulm
A. Egbert
Boris Tkachenko
Boris N. Chichkov
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Citations (8)
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