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Roel J. Theeuwes
Roel J. Theeuwes
Eindhoven University of Technology
Passivation
Materials science
Optoelectronics
Semiconductor
Germanium
5
Papers
7
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0
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POx/Al2O3 Stacks for c-Si Surface Passivation: Material and Interface Properties
2021
Roel J. Theeuwes
Jimmy Melskens
Lachlan E. Black
Wolfhard Beyer
Dibyashree Koushik
Wilhelmus J. H. (Willem-Jan) Berghuis
Bart Macco
Wilhelmus M. M. Kessels
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Excellent surface passivation of germanium by a-Si:H/Al2O3 stacks
2021
Journal of Applied Physics
Wilhelmus J. H. (Willem-Jan) Berghuis
Jimmy Melskens
Bart Macco
Roel J. Theeuwes
Lachlan E. Black
Marcel A. Verheijen
Wilhelmus M. M. Kessels
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Surface passivation of germanium by atomic layer deposited Al 2 O 3 nanolayers
2021
Journal of Materials Research
Wilhelmus J. H. (Willem-Jan) Berghuis
Jimmy Melskens
Bart Macco
Roel J. Theeuwes
Marcel A. Verheijen
Wilhelmus M. M. Kessels
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Invited) Semiconductor Surface Passivation by ALD and CVD Prepared Nanolayers
2021
Wilhelmus M. M. Kessels
Wilhelmus J. H. (Willem-Jan) Berghuis
Roel J. Theeuwes
Marcel A. Verheijen
Bart Macco
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Excellent Passivation of n ‐type Silicon Surfaces Enabled by Pulsed‐Flow Plasma‐Enhanced Chemical Vapor Deposition of Phosphorus Oxide Capped by Aluminum Oxide
2020
Physica Status Solidi-rapid Research Letters
Jimmy Melskens
Roel J. Theeuwes
Lachlan E. Black
Willem-Jan H. Berghuis
Bart Macco
P.C.P. Bronsveld
Erwin Kessels
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Citations (4)
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