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L G Ventzek Peter
L G Ventzek Peter
Plasma
Plasma processing
Substrate (chemistry)
Charged particle
Dopant
2
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2024
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The plasma processing apparatus and measurement method
2015
yuuki kobayasi
Yuuki Kobayashi
hirokazu ueda
Hiroichi Ueda
akira taira yamasita
Kohei Yamashita
ventue . piitaa . eru . zii
L G Ventzek Peter
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Xe/Neプラズマ中電子・励起粒子特性のボルツマン方程式解析 : レーザ光吸収効果
1997
satosi utida
kou tuyosi sugawara
L G Ventzek Peter
yousuke sakai
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1