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Chester Huang
Chester Huang
IBM
Materials science
Lithography
Optics
Electron-beam lithography
Resist
5
Papers
3
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Ultrathin membrane masks for electron projection lithography
2004
Journal of Vacuum Science & Technology B
Obert R. Wood
W. J. Trybula
Johann Greschner
S. Kalt
T. Bayer
S. Shimizu
H Yamamoto
Kazuaki Suzuki
Michael S. Gordon
Christopher F. Robinson
Rajinder S. Dhaliwal
Carey W. Thiel
N. Caldwell
Mark Lawliss
Chester Huang
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Current developments of a high-performance CA resist for mask-making application
2003
Wu-Song Huang
Wei He
Wenjie Li
Wayne M. Moreau
Robert Lang
David R. Medeiros
Karen Petrillo
Arpan P. Mahorowala
Marie Angelopoulos
Christina Deverich
Chester Huang
Paul A. Rabidoux
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Resist heating effect on e-beam mask writing at 75 kV and 60 A/cm 2
2003
Zdenek Benes
Christina Deverich
Chester Huang
Mark Lawliss
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Process for improved reflectivity uniformity in extreme-ultraviolet lithography (EUVL) masks
2003
Carey W. Thiel
Kenneth C. Racette
Emily Fisch
Mark Lawliss
Louis Kindt
Chester Huang
Robin Ackel
Max G. Levy
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Enhancement of KRS-XE for 50 keV Advanced Mask Making Applications
2002
Karen Petrillo
David R. Medeiros
J. Bucchignano
Marie Angelopoulos
Dario L. Goldfarb
Wu-Song Huang
Wayne M. Moreau
Robert Lang
Chester Huang
Christina Deverich
Thomas John Cardinali
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