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Joshua I. Wheeler
Joshua I. Wheeler
Brigham Young University
Ellipsometry
Materials science
Photoresist
Microfabrication
SU-8 photoresist
3
Papers
2
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0
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Computational determination of coordination structure impact on adsorption and acidity of pristine and sulfated MOF-808
2021
Bo Yang
Joshua I. Wheeler
Brett Sorensen
Robert Steagall
Taylor Nielson
Jianhua Yao
Jose Mendez-Arroyo
Daniel H. Ess
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Spectroscopic ellipsometry of SU‐8 photoresist from 190 to 1680 nm (0.740–6.50 eV)
2020
Surface and Interface Analysis
George H. Major
Sean C. Chapman
Jeffrey T. Chapman
Joshua I. Wheeler
Shiladitya Chatterjee
Cody V. Cushman
Daniel H. Ess
Matthew R. Linford
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Diphenylsiloxane–dimethylsiloxane copolymer: Optical functions from 191 to 1688 nm (0.735–6.491 eV) by spectroscopic ellipsometry
2020
Surface Science Spectra
Dhananjay I. Patel
Dhruv Shah
Tuhin Roychowdhury
Joshua I. Wheeler
Daniel H. Ess
James N. Hilfiker
Matthew R. Linford
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