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Tomonori Takahashi
Tomonori Takahashi
Keio University
Analytical chemistry
Self-diffusion
Semiconductor
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3
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116
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The Effect of Partial Pressure of Oxygen on Self-Diffusion of Si in SiO2
2003
Japanese Journal of Applied Physics
Shigeto Fukatsu
Tomonori Takahashi
Kohei M Itoh
Masashi Uematsu
Akira Fujiwara
Hiroyuki Kageshima
Yasuo Takahashi
Kenji Shiraishi
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Citations (10)
Effect of the Si/SiO2 interface on self-diffusion of Si in semiconductor-grade SiO2
2003
Applied Physics Letters
Shigeto Fukatsu
Tomonori Takahashi
Kohei M Itoh
Masashi Uematsu
Akira Fujiwara
Hiroyuki Kageshima
Yasuo Takahashi
Kenji Shiraishi
Ulrich Gösele
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Citations (47)
Self-diffusion of Si in thermally grown SiO2 under equilibrium conditions
2003
Journal of Applied Physics
Tomonori Takahashi
Shigeto Fukatsu
Kohei M Itoh
Masashi Uematsu
Akira Fujiwara
Hiroyuki Kageshima
Yasuo Takahashi
Kenji Shiraishi
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Citations (59)
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