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H. Yeung
H. Yeung
Philips
Materials science
Copper
Metallurgy
Chemical-mechanical planarization
Inorganic chemistry
1
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14
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Determination of the Planarization Distance for Copper CMP Process
1999
MRS Proceedings
S Hymes
K. Smekalin
Tom Brown
H. Yeung
M. Joffe
Matthew J. Banet
Tae H. Park
Tamba Tugbawa
Duane S. Boning
John Nguyen
T. West
W. Sands
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Citations (14)
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