Old Web
English
Sign In
Acemap
>
authorDetail
>
M. J. Edgell
M. J. Edgell
Analytical chemistry
Auger electron spectroscopy
X-ray photoelectron spectroscopy
Secondary ion mass spectrometry
Ion implantation
5
Papers
103
Citations
0.00
KQI
Citation Trend
Filter By
Interval:
1900~2024
1900
2024
Author
Papers (5)
Sort By
Default
Most Recent
Most Early
Most Citation
No data
Journal
Conference
Others
SiO2 thickness determination by X-ray photoelectron spectroscopy, Auger electron spectroscopy, secondary ion mass spectrometry, Rutherford backscattering, transmission electron microscopy, and ellipsometry
2000
Journal of Vacuum Science & Technology B
D. A. Cole
Jeffrey Shallenberger
Steven W. Novak
R.L. Moore
M. J. Edgell
S.P. Smith
C. J. Hitzman
J.F. Kirchhoff
E. Principe
W. Nieveen
F. K. Huang
S. Biswas
R. J. Bleiler
K. S. Jones
Show All
Source
Cite
Save
Citations (82)
Oxide thickness determination by XPS, AES, SIMS, RBS and TEM
1999
Jeffrey Shallenberger
D. A. Cole
Steven W. Novak
R.L. Moore
M. J. Edgell
S.P. Smith
C. J. Hitzman
J.F. Kirchhoff
E. Principe
S. Biswas
R. J. Bleiler
W. Nieveen
K. S. Jones
Show All
Source
Cite
Save
Citations (12)
A review of analytical techniques for process control of contaminants introduced during ion implantation
1999
S. Biswas
I. Kelly
V.K.F. Chia
P. Lindley
M. J. Edgell
Show All
Source
Cite
Save
Citations (5)
Analytical techniques for measuring contamination introduced during ion implantation
1996
Journal of Stroke & Cerebrovascular Diseases
S. Biswas
F. McQuillan
S. Littlewood
I. Kelly
M. J. Edgell
V.K.F. Chia
A.J. Murrell
M.T. Wauk
Show All
Source
Cite
Save
Citations (2)
Measurement of the elemental composition of a‐SiC:H films by electron spectroscopy and high energy ion scattering spectrometry
1992
Journal of Vacuum Science and Technology
M. J. Loboda
S Baumann
M. J. Edgell
K. Stolt
Show All
Source
Cite
Save
Citations (2)
1