Old Web
English
Sign In
Acemap
>
authorDetail
>
V. De Jonghe
V. De Jonghe
NXP Semiconductors
Static random-access memory
Lithography
Photolithography
Cost reduction
Electrical engineering
3
Papers
15
Citations
0.00
KQI
Citation Trend
Filter By
Interval:
1900~2024
1900
2024
Author
Papers (3)
Sort By
Default
Most Recent
Most Early
Most Citation
No data
Journal
Conference
Others
Electron beam direct write lithography flexibility for ASIC manufacturing: an opportunity for cost reduction (Keynote Paper)
2005
L. Pain
M. Jurdit
J. Todeschini
Serdar Manakli
B. Icard
Blandine Minghetti
G. Bervin
A. Beverina
F. Leverd
M. Broekaart
P. Gouraud
V. De Jonghe
P. Brun
S. Denorme
F. Bœuf
V. Wang
Daniel Henry
Show All
Source
Cite
Save
Citations (11)
Electron beam direct write lithography flexibility for ASIC manufacturing: an opportunity for cost reduction
2005
L. Pain
M. Jurdit
J. Todeschini
S. Manakli
B. Icard
B. Minghetti
G. Bervin
A. Beverina
Francois Leverd
M. Broekaart
Pascal Gouraud
V. De Jonghe
P. Brun
Stephane Denorme
Frederic Boeuf
V. Wang
Daniel Henry
Show All
Source
Cite
Save
Citations (1)
Advanced patterning studies using shaped e-beam lithography for 65-nm CMOS preproduction
2003
Laurent Pain
Murielle Charpin
Yves Laplanche
David Herisson
J. Todeschini
R. Palla
A. Beverina
H. Leininger
S. Tourniol
M. Broekaart
Emmanuelle Luce
F. Judong
K. Brosselin
Y. Le Friec
F. Leverd
S. Del Medico
V. De Jonghe
Daniel Henry
M. Woo
F. Arnaud
Show All
Source
Cite
Save
Citations (3)
1