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Hiroyuki Sigemura
Hiroyuki Sigemura
Mask inspection
Photolithography
Extreme ultraviolet
Lithography
Phase-shift mask
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A novel defect detection optical system using 199-nm light source for EUVL mask
2010
Proceedings of SPIE
Ryoichi Hirano
Nobutaka Kikuiri
Masatoshi Hirono
Riki Ogawa
Hiroyuki Sigemura
Kenichi Takahara
Hideaki Hashimoto
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