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B.P. Tinkham
B.P. Tinkham
Analytical chemistry
Optoelectronics
Materials science
Sputter deposition
Pulsed DC
7
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36
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セラミック及び金属回転ターゲットからのパルスDCマグネトロンスパッタリングにより低温で蒸着した高導電性で透明なITO膜【Powered by NICT】
2017
Surface & Coatings Technology
C. David
B.P. Tinkham
P. Prunici
A. Panckow
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Highly conductive and transparent ITO films deposited at low temperatures by pulsed DC magnetron sputtering from ceramic and metallic rotary targets
2017
Surface & Coatings Technology
C. David
B.P. Tinkham
P. Prunici
A. Panckow
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Citations (16)
SiOxNY Barrier Layers Deposited by Medium Frequency and Pulsed-DC Dual Magnetron Sputtering
2015
B.P. Tinkham
A. Panckow
C. David
P. Prunici
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Citations (1)
Modification of electrical properties induced by annealing of ZnO:B thin films deposited by chemical vapour deposition: Kinetic investigation of evolution
2013
Materials Science and Engineering B-advanced Functional Solid-state Materials
C. David
F. Paumier
B.P. Tinkham
D. Eyidi
M. Marteau
P. Guérin
T. Girardeau
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Citations (4)
Microstructural and conductivity changes induced by annealing of ZnO:B thin films deposited by chemical vapour deposition
2011
Journal of Physics: Condensed Matter
C. David
T. Girardeau
F. Paumier
D. Eyidi
Bertrand Lacroix
N Papathanasiou
B.P. Tinkham
P. Guérin
M. Marteau
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Citations (15)
The effects of InAlAs strained-superlattice barriers upon the properties of InGaAlAs/InP quantum wells and double heterostructures
1997
IPRM | International Conference on Indium Phosphide and Related Materials
R. D. Dupuis
R. V. Chelakara
B.P. Tinkham
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